Silica coating liquid for forming low dielectric constant and silica coat substrate with low dielectric constant

低誘電率シリカ系被膜形成用塗布液および低誘電率シリカ系被膜付基板

Abstract

PROBLEM TO BE SOLVED: To provide a silica coating liquid for forming low-dielectric constant with a dielectric constant as small as <=2.5, having low moisture absorbability and high mechanical strength. SOLUTION: This coating liquid contains (A) at least one silicon compound selected from the group consisting of alkoxysilanes of the general formula (I): XnSi(OR)4-n and silane halides of the general formula (II): XnSiX'4-n and (B) an organic template material of the general formula (III): [R1R2R3R4N]+Y- (in these formulas, X is H, F, a 1-8C alkyl, fluorine-substituted alkyl, aryl or vinyl; R is H, a 1-8C alkyl, aryl or vinyl; X' is a halogen atom; n is an integer of 0-3; R1 is a 1-20C hydrocarbon group; R2 to R4 are each H or a 1-20C hydrocarbon group and may be the same as R1; and Y is a halogen atom or OH).
(57)【要約】 【課題】 比誘電率が2.5以下と小さく、しかも低水 分吸着性と高被膜強度の特性を有する低誘電率シリカ系 被膜を形成する塗布液を提供する。 【解決手段】(A)下記一般式(I)で示されるアルコキシシ ランおよび下記一般式(II)で示されるハロゲン化シラン からなる群から選ばれる1種以上のケイ素化合物および /またはその加水分解物と、(B)下記一般式(III)で表さ れる有機テンプレート材とを含んでなる低誘電率シリカ 系被膜形成用塗布液。 X n Si(OR) 4-n (I)、 X n SiX' 4-n (II) [R 1 R 2 R 3 R 4 N] + Y - (III) (式中、Xは水素原子、フッ素原子、または炭素数1〜 8のアルキル基、フッ素置換アルキル基、アリール基、 ビニル基を表し、Rは水素原子、または炭素数1〜8の アルキル基、アリール基、ビニル基を表し、X'はハロ ゲン原子を表す。nは0〜3の整数である。R 1 は炭素 数が1〜20の炭化水素基、R 2 〜R 4 はH原子または炭 素数が1〜20の炭化水素基であり、さらにR 1 と同一 であっても良い。Yはハロゲン原子またはOH基を示 す。)

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